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Detailed Program
Paper Number : TF-O03
Time Frame : 17:07~17:19
Presentation Date : Friday, 28, November
Session Name : Thin Films & Layers
Session Chair 1# : Soon-Gil Yoon
Session Chair 2# : Hiroshi Funakubo
Fabrication and field emission properties of nanostructuralized diamond films
Chunyuan Lu
Pusan National University

The excellent properties of diamond as electron emitting materials for its low or negative electron affinity, superior mechanical, inert chemical properties and fine thermal conductivities, is drawing lots of attention. While compared with the fabrication of array sharp tip shaped metals or semiconductors, the deposition of diamond films by microwave plasma enhanced chemical vapor deposition (MPECVD) is much efficient. Seeding substrate is vital process to obtain high nucleation densities for the growth of continuous diamond films. In this research, two types of seeding methods are applied, scratching by diamond particles and ultrasonic bath with nanodiamond suspension as pre-seeding treatment. In the comparison of these two methods, the seeding result indicates that ultrasonic bath with nanodiamond suspension is more satisfying. Afterwards diamond films were deposited on p-type Si (100) substrate by MPECVD. Then diamond films were characterized by Raman spectroscopy, XRD, SEM and AFM. In order to obtain nanostructuralized diamond films, firstly gold, nickel and copper were used as masking material for nanostructuralized of diamond by RF plasma etching process. Applying plasma in a mixtured gas of CF4/O2 results in different types of diamond nanostructures, depending on the type of mask material used. This is a simple etching method for obtaining nanostructuralized surfaces of diamond films without complicated lithographic steps. Finally, the field emission properties of obtained nanostructuralized diamond films were investigated. The experiment results indicated that nanostructuralized diamond films showed enhanced field emission properties than non-nanostructure diamond films. The enhanced field emission properties of nanostructuralized diamond films is contributed to the nanostructures of the diamond surface.
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